- ion-assisted deposition
- Optics: IAD
Универсальный русско-английский словарь. Академик.ру. 2011.
ion-assisted deposition
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Ion beam deposition — (IBD) is a process of applying materials to a target through the application of an ion beam.In an ion source source materials gases or evaporated solids are ionized using electron ionization or by application of high electric fields (Penning ion… … Wikipedia
Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… … Wikipedia
Ion plating — is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition . Ion plating utilizes concurrent or periodic bombardment of the substrate and … Wikipedia
Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
Ionenstrahlgestützte Deposition — Die ionenstrahlgestützte Deposition, auch ionenstrahlgestützte Abscheidung, ionenstrahlgestützte Beschichtung oder ionenstrahlgestützte Beschichtungstechnik genannt, (englisch ion beam assisted deposition, IBAD) ist ein… … Deutsch Wikipedia
Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… … Wikipedia
Ion Gheorghe Maurer — Infobox Prime Minister name = Ion Gheorghe Maurer nationality =Romanian small caption = order =Prime Minister of Romania term start =March 21, 1961 term end =March 29, 1974 vicepresident = deputy = predecessor =Chivu Stoica successor =Manea… … Wikipedia
Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… … Wikipedia
Physical vapor deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… … Deutsch Wikipedia
Physical vapour deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… … Deutsch Wikipedia
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
